Description
Please contact us if you are interested in the Nanotechnology Equipment . The Nanotechnology Equipment is only for end users and are subject to prior sale without notice. Appreciate your time.
- Rigaku SmartLab X-ray Diffractometer
- Advanced Vacuum Vision 310 Plasma Enhanced Chemical Vapor Deposition System
- AFM Asylum Research MFP3D Atomic Force Microscope
- Airco Temescal FC-1800 Evaporator
- Airco Temescal FC-1800 Evaporator
- Alcatel AMS 100 Deep Reactive Ion Etcher
- AMAT AMP-3300 PECVD
- Atmospheric Oven Fischer Scientific Isotemp Oven
- Atomic Layer Deposition: Ultratech/Cambridge Nanotech Savannah S200
- Branson IPC 3000
- Branson/IPC 3000
- Branson/IPC 4150
- Confocal Microscope Olympus Microscope with CARVII spinning disc confocal system
- Critical Point Dryer Tousimis Semidri PVT-3
- Cryo Ultramicrotome Leica EM UC7 and UFC7
- CVC Products AST-601 Sputter
- EDS on SEM EDS Oxford instruments, INCA PentaFET -x3
- EDS on TEM Oxford instruments, INCA Energy TEM 250
- EG 1034
- EG 2001X with NAVITAR
- EG4085
- Electron Beam Evaporator – Kurt Lesker PRO Line PVD 75
- Electron Beam Evaporator Thermionics VE-100
- Ellipsometer J. A. Woollam Variable Angle Spectroscopic Ellipsometer
- ESEM FEI Quanta 200 Field Emission Gun
- FIB FEI Helios 600 Nanolab Dual Beam System
- Gasonics Aura 2000LL
- Gasonics L3500
- Gasonics L3510
- Heatpulse 210
- Heatpulse 4100
- Heatpulse 4108
- Heatpulse 610
- Heatpulse 610
- Heatpulse 8108
- Heatpulse 8800
- Hot Embosser JenOptik HEX03
- HP 4062 and Testers
- Kurt J Lesker Dual Thermo Evaporator
- Lam Auto Etch 590
- Lam AutoEtch 590
- Lam Rainbow 4728
- Laser Ablation Resonetics Rapid X250
- Mask Aligner Karl Suss MA6/BA6
- Matrix 105
- Matrix 205
- Matrix 302
- Matrix 303
- Matrix Bobcat 209S
- Matrix Bobcat 209S
- Matrix System One Stripper
- Metal Sputtering Kurt Lesker PVD 75
- Mini-Pulse 310
- MRC 603 MRC 693 TES-600 Sputter
- MRC 603 Sputter
- MRC 603 Sputter
- MRC 643 Sputter
- MSP – Microspectrophotometer
- MSP – Microspectrophotometer
- Multiplex ICP MACS
- Nanometrics 210 Nanospec AFT
- Olympus MX50A-F with Al100-L6
- Optical Microscope Nikon Eclipse LV150
- Oxygen Plasma System AutoGlow by Glow Research
- Perkin-Elmer 4400 Sputter
- Perkin-Elmer 4400 Sputter
- Plasma Therm 700
- Plasma Therm 700 Plasma Etch&PECVD
- Plasmalab CVD-2
- Plasmatherm 790
- Plasmatherm SLR 720
- PLD PVD Products Nano-PLD-1000 Pulsed Laser Deposition System
- RTP-3000
- SEM Hitachi S-4700 Cold Cathode Field Emission Scanning Electron Microscope
- Sputter Coater Cressington 108 Auto Sputter Coater
- STS MESC Multiplex ICP
- STS multi-chamber Cluster
- STS Multiplex DRIE
- STS Multiplex ICP
- STS Mutiplex ICP
- STS PRO ICP Etcher
- Stylus Profiler KLA Tencor P-6
- Tegal 903e Plasma Etch
- Tegal 903e Plasma Etch
- Tegal 903e Plasma Etch
- TEM TEM JEOL 100CX II
- TEM TEM JEOL 2010F-FasTEM
- Temescal BJD-1800 Sputter
- Temescal FC-1800 Evaporator
- Temescal FC-1800 Evaporator
- Temescal FC-1800 Evaporation
- Thin-Film Mapper Filmetrics F50
- Ultramicrotome Sorvall MT6000
- UPS Kratos Axis Ultra DLD Ultraviolet Photoelectron Spectrometer
- Varian 3118 E-Beam Thermal Evaporator
- XPS Kratos Axis Ultra DLD X-ray Photoelectron Spectrometer
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