Description
Please contact us if you are interested in the Nanotechnology Equipment . The Nanotechnology Equipment is only for end users and are subject to prior sale without notice. Appreciate your time.
- FEI Tecnai Osiris (S)TEM
- FEI Nova NanoSEM450
- JEOL JEM 2010 TEM
- Heatpulse 8800
- Heatpulse 8108
- Heatpulse 4108
- Heatpulse 4100
- Heatpulse 610
- Mini-Pulse 310
- Heatpulse 610
- Heatpulse 210
- RTP-3000
- Allied multiprep lapping and grinding machine
- Branson ultrasonic cleaner 2200
- Buehler Isomet slow speed saw
- Cressington Au sputter coater
- Cressington Carbon coater
- Fischione ultrasonic disc cutter
- Fischione plasma nanoclean
- Gatan PIPS 691
- Gatan PIPS II 695
- Gatan dimple grinder 656
- EG 1034
- EG 2001X with NAVITAR
- EG4085
- Olympus MX50A-F with Al100-L6
- Nanometrics 210 Nanospec AFT
- HP 4062 and Testers
- Intek optical microscope
- Leica stereo microscope ZOOM 2000
- SBT lapping and polishing machine 910
- SBT rotation cutter 360
- VCR Group Inc. Dimpler D500i
- Nanoscribe System
- Zygo Optical Profiler
- Cluster-Deposition Systems
- Cambridge Nanotech atomic-layer-deposition tool Fiji200 Atomic Layer Deposition (ALD)
- Glancing Angle Deposition (GLAD)
- Chemical Synthesis of Nanowires and 2D Systems
- AJA Magnetron Sputtering Coating System
- Anasys afm+
- Anasys nanoIR2-s
- Asylum MFP-3D-Bio AFM
- CellScale Biomechanical Testing System
- Coherent Astrella femtosecond laser
- Confocal Laser Scanning Microscope
- Environmental SEM
- EnvisionTEC 3D-Bioplotter Manufacturer Series
- FEI Helios NanoLab 660
- Hysitron TI 950 Triboindenter
- Branson IPC 3000
- Matrix 105
- Matrix 205
- Matrix Bobcat 209S
- Matrix Bobcat 209S
- Gasonics L3510
- Gasonics L3500
- Gasonics Aura 2000LL
- Matrix System One Stripper
- Lumex Avance-25 Metal 3D Printer
- Optomec LENS Machine Tool Series
- Probe Station
- Spark Plasma Sintering
- Stratasys Objet 500 Connex3 3D printer
- VersaLab 3 Tesla Cryogen-free VSM
- ZEISS LSM 800 with Airyscan
- 3D printer Make: Stratasys, Ltd. Model: Objet 500 Connex3
- Atomic Force Microscope Make: Anasys Instruments Model: afm+
- Bio Atomic Force Microscope Make: Asylum Research Model: MFP-3D™
- Cell Culture Lab
- Confocal laser scanning microscope Make: Keyence Corporation Model: VK-X200K
- Cryogenic Probe Station Make: Lake Shore Cryotronics Inc Model: TTP4
- Dual Beam FIB/SEM Make: FEI Company Model: Helios 660
- Environmental SEM Make: FEI Company Model: Quanta 200
- Femtosecond Laser System Make: Coherent Inc. Model: Astrella
- nanoIR2-s Make: Anasys Instruments Model: nanoIR2-s
- Spark Plasma Sintering System Make: Thermal Technology LLC Model: 10-4 spark plasma sintering
- Sputtering Coating System RF/DC Make: AJA International Model: Flagship ATC 2200
- Triboindenter Make: Hysitron LLC Model: TI 950
- Vibrating Sample Magnetometer Make: Quantum Design Inc Model: VersaLabTM
- CellScale Biomechanical Testing System
- Helios NanoLab™ Dual Beam 660
- ATC Flagship Series Sputtering Coating System
- FEI Quanta 200 Environmental SEM
- Keyence laser scanning microscope VK-X200K
- Coherent Astrella femtosecond laser
- Lumex Avance-25 Metal 3D Printer
- Optomec LENS Machine Tool Series
- Spark Plasma Sintering System
- Stratasys Objet 500 Connex3 3D printer
- Plasma Therm 700 Plasma Etch&PECVD
- AMAT AMP-3300 PECVD
- Varian 3118 E-Beam Thermal Evaporator
- CVC Products AST-601 Sputter
- Airco Temescal FC-1800 Evaporator
- Temescal FC-1800 Evaporation
- Temescal FC-1800 Evaporator
- Temescal FC-1800 Evaporator
- Airco Temescal FC-1800 Evaporator
- Temescal BJD-1800 Sputter
- MRC 603 Sputter
- MRC 643 Sputter
- MRC 603 Sputter
- MRC 603 MRC 693 TES-600 Sputter
- Perkin-Elmer 4400 Sputter
- Perkin-Elmer 4400 Sputter
- Kurt J Lesker Dual Thermo Evaporator
- Plasmalab CVD-2
- Cryogenic Lakeshore Probe Stations
- VersaLab 3 Tesla Cryogen-free VSM
- Anasys Instruments afm+
- Anasys nanoIR2-s
- Asylum MFP-3D-Bio AFM
- Hysitron TI 950 Triboindenter
- EBL Electron Beam Lithography (EBL) System
- DWL66 Heidelberg DWL 66FS Laser Lithography system
- MJB4 SUSS MicroTec MJB4 Mask Aligner
- Electron Beam Lithography (EBL)
- Laser Lithography system (Heidelberg DWL66)
- Optic Lithography (SUSS MJB-4 Mask Aligner)
- Reactive Ion Etching (Trion Minilock)
- Wet Etching Bench
- Deep RIE (Oxford PlasmaLab 100)
- Ion milling/Supttering (Intlvac Nanoquest-I)
- Stylus Profilometer (Dektak XT)
- Reflective Film Thickness Measurement System (Filmetrics F40)
- Optic Microscope with camera (Nikon Eclipse L200N)
- Four-probe Resistivity Measurement Stand (Lucas 302)
- Spinner (Laurell WS-400-6NPP)
- Hot Plate (Super Nuova 120)
- Oven (Thermo Scientific 3492M)
- UltraSonic Cleaner (Brason 2510)
- E-beam Evaporation (AJA ATC-ORION 8000)
- Focused-Ion Beam (FEI Strata 200)
- Bruker Dimension ICON Atomic Force Microscope
- DI EnviroScope Atomic Force Microscope
- DI Nanoscope IIIa Dimension 3100 SPM system
- Thermal analysis systems DSC 204 ,Differential scanning calorimeter
- Thermal analysis systems TGA 209, Thermogravimetry analysis system
- Olympus BX51 polarizing microscope
- Tukon 2500 Knoop and Vickers tester
- ThermoFisher K-Alpha XPS/UPS Photoelectron Spectrometer
- Buehler ISOMet 1000 Precision Saw
- Buehler MiniMet 1000 Grinder-polisher
- Sartorius Cubis MSU2.7S-000-DM Microbalance
- Rigaku SmartLab Diffractometer
- Bruker-AXS D8 Discover Diffractometer
- PANalytical Empyrean Diffractometer
- Rigaku D/Max-B Diffractometer
- Rigaku Multiflex Diffractometer
- Bruker Photon Single Crystal Diffractometer
- Rigaku Supermini 200 WDXRF Spectrometer
- STS PRO ICP Etcher
- STS Multiplex DRIE
- STS Multiplex ICP
- STS MESC Multiplex ICP
- Multiplex ICP MACS
- STS multi-chamber Cluster
- STS Mutiplex ICP
- Matrix 302
- Matrix 303
- Tegal 903e Plasma Etch
- Tegal 903e Plasma Etch
- Tegal 903e Plasma Etch
- Lam AutoEtch 590
- Lam Auto Etch 590
- Lam Rainbow 4728
- Plasma Therm 700
- Plasmatherm SLR 720
- Plasmatherm 790
- Branson/IPC 4150
- Branson/IPC 3000
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