Description
Please contact us if you are interested in the Nanotechnology Equipment . The Nanotechnology Equipment is only for end users and are subject to prior sale without notice. Appreciate your time.
- 2D Gel DIGE and Image Analysis Equipment
- AB-M Contact Aligner,Shipley SPR 1813 exposure
- Acid Process Wetbench ,Photoresist strip and BOE etch wetbench.
- Agilent 6340 Ion Trap with 1100 nano-HPLC
- Agilent 6520 Q-TOF with Agilent 1100 nano-HPLC
- Agilent 6538 Q-TOF with Agilent 1290 UHPLC
- Ambios XP2 ,a computer controlled stylus profilometer,Step Height thickness measurement
- Amod Evaporator,Aluminum thin film,Chrome thin film,Gold thin film,Silicon Dioxide thin film,Titanium thin film
- Angstrom Sputter System ,Aluminum thin film,Chrome thin film,Gold thin film,Iron thin film,Permalloy thin film,Silicon Dioxide thin film,Titanium thin film
- Atomic Force Microscope,VEECO MultiMode V and Dimension 3100
- ATV PEO 603 Thermal Oxidation tube furnace
- Brewer Cee 100CB ,programmable spin coater and hotplate,Spin Coating
- Bruker Autoflex
- Bruker maXis Impact with Dionex 3000 nano-uHPLC
- Bruker micrOTOF with Agilent 1290 UHPLC
- Crest Ultrasonic Cleaner
- Critical Point Dryer Tousimis Samdri 795
- EMS HotplateEpifluorescence Optical Microscope Olympus BX61
- Field Emission Scanning Electron Microscope Zeiss SUPRA 55VP
- GC-MS Agilent and Shimadzu instruments
- K&S 4523AD Wire Bonder
- March 1703
- Microautomation 1006 Dicing Saw
- Modulab Evaporator, Thermal evaporator for Aluminum
- MRL Oxidation Thermal Oxidation manual tube furnace
- Nanospec 3000 ,A tabletop reflectance spectrometer that measures the thickness of standard thin films
- Oxford ICP, the Oxford Plasmalab System 100 ICP-RIE
- Oxidation Diffusion Wetbench Wet process station for RCA cleaning of silicon substrates prior to oxidation or diffusion
- PVA Tepla Ion 10
- Scanning Auger Electron Nanoprobe Physical Electronics 710
- Scanning Electron Microscope JEOL JSM-6100
- Solvent/Headway Spinner Bench
- Time-of-Flight Secondary Ion Mass Spectrometer PHI TRIFT 1
- TrioTech Hotplate
- Waters Synapt G2S-i Q-TOF with ion mobility
- X-ray Photoelectron Spectrometer Physical Electronics 5600
- X-Ray Powder Diffraction Spectrometer SCINTAG X1 Diffraction System
- YES III Vapor Prime Oven,HMDS coating,yeild engineering ,used to coat substrates with a monolayer of HMDS.
- STS PRO ICP Etcher
- STS Multiplex DRIE
- STS Multiplex ICP
- STS MESC Multiplex ICP
- Multiplex ICP MACS
- STS multi-chamber Cluster
- STS Mutiplex ICP
- Matrix 302
- Matrix 303
- Tegal 903e Plasma Etch
- Tegal 903e Plasma Etch
- Tegal 903e Plasma Etch
- Lam AutoEtch 590
- Lam Auto Etch 590
- Lam Rainbow 4728
- Plasma Therm 700
- Plasmatherm SLR 720
- Plasmatherm 790
- Branson/IPC 4150
- Branson/IPC 3000
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