Description
Please contact us if you are interested in the following Furnace Equipment and tools. The Furnace Equipment and tools are only for end users and are subject to prior sale without notice. Appreciate your time.
- LPCVD LTO MRL Industries Furnace for low temperature oxide deposition on silicon based substrates
- LPCVD Nitride MRL Industries Furnace for sililcon nitride deposition on silicon based substrates
- MOS Clean Anneal MRL Industries Furnace for annealing silicon compatible substrates
- MOS Clean Hoods Wet Deck for SC-1, SC-2 cleaning of wafers
- MOS Metal Anneal MRL Industries Furnace for annealing of silicon based materials with approved metals
- MOS Metal Anneal MRL Industries Furnace for annealing silicon wafers with a limited set of metals
- N+/P+ Polysilicon MRL Industries Furnace for deposition of polysilicon on silicon substrates
- Phosphorus Doping Solid source phosphorus diffusion tube
- Boron Doping Solid Source Boron Diffusion
- Carbon Nanotube/Graphene Furnace First Nano Carbon Nanotube and Graphene Furnace
- CMOS N+ Polysilicon CMOS N+ Polyslicon Furnace
- CMOS Wet Oxide CMOS Wet Oxidation Furnace
- General Material Anneal MRL Industries Furnace for nitrogen anneals or oxidation of nonelectronic substrates
- LPCVD CMOS Nitride LPCVD Nitride
- TFT LPCVD LTO410 MRL Industries Furnace for low temperature oxide depositions on TFT compatible substrates
- TFT Polysilicon MRL Industries Furnace for polysilicon deposition on TFT compatible substrates
- TFT Wet/Dry Oxide MRL Industries Furnace for thermal oxidation of TFT compatible substrates
- Wet/Dry Oxide MRL Industries Furnace for oxidation of silicon substrates
- MOS Clean Anneal MRL Industries Furnace for annealing silicon compatible substrates
- MOS Clean Hoods Wet Deck for SC-1, SC-2 cleaning of wafers
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