Semiconductor Equipment

Description

Please contact us if you are interested in the following  Semiconductor Equipment. The  Semiconductor Equipment are only for end users and are subject to prior sale without notice. Appreciate your time.

1. Teikoku Taping System Co., Ltd. DXL2-800HS-BL-CE Tape Laminator
2. Temptronic/InTest TPO4100A-2 Temperature Forcing Unit
3. Tescan FERA3 XMH FE SEM
4. Tokyo Electron Ltd. UW300Z Batch Wafer Processing
5. Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
6. Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
7. Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
8. Tokyo Electron Ltd. CLEAN TRACK LITHIUS Pro Multi Block (Resist Coater/Developer)
9. Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)
10. Tokyo Electron Ltd. Telius SP-305 SCCM Dielectric Etch
11. Tokyo Electron Ltd. Telius 305 SCCM Dielectric Etch
12. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
13. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
14. Tokyo Electron Ltd. TELINDY IRAD ALD High-K Vertical LPCVD Furnace
15. Tokyo Electron Ltd. Trias W MOCVD
16. Tokyo Electron Ltd. Trias W MOCVD
17. Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)
18. Tokyo Electron Ltd. TELINDY Plus ALD High-K Vertical Furnace – Other
19. Tokyo Electron Ltd. TELINDY Plus ALD High-K Vertical Furnace – Other
20. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
21. Tokyo Electron Ltd. Telius SP-305 SCCM Dielectric Etch
22. Tokyo Electron Ltd. Tactras Vigus Dielectric Etch
23. Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
24. Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
25. Tokyo Electron Ltd. TELINDY Plus ALD High-K Vertical Furnace – Other
26. Tokyo Electron Ltd. TELINDY Plus ALD High-K Vertical Furnace – Other
27. Tokyo Electron Ltd. ALPHA-303i Anneal Vertical Anneal Furnace
28. Tokyo Electron Ltd. ALPHA-303i Anneal Vertical Anneal Furnace
29. Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)
30. Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)
31. Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)
32. Tokyo Electron Ltd. CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer)
33. Tokyo Electron Ltd. CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer)
34. Tokyo Electron Ltd. TELINDY ALD High-K Vertical LPCVD Furnace
35. Tokyo Electron Ltd. TELINDY ALD High-K Vertical LPCVD Furnace
36. Tokyo Electron Ltd. TELINDY Plus ALD High-K Vertical Furnace – Other
37. Tokyo Electron Ltd. TELINDY ALD High-K Vertical LPCVD Furnace
38. Tokyo Electron Ltd. TELINDY Plus ALD High-K Vertical Furnace – Other
39. Tokyo Electron Ltd. ALPHA-303i Anneal Vertical Anneal Furnace
40. Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
41. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
42. Tokyo Electron Ltd. TELINDY ALD High-K Vertical LPCVD Furnace
43. Tokyo Electron Ltd. TELINDY Plus Anneal Vertical Anneal Furnace
44. Tokyo Electron Ltd. TELINDY ALD High-K Vertical LPCVD Furnace
45. Tokyo Electron Ltd. TELINDY Anneal Vertical Anneal Furnace
46. Tokyo Electron Ltd. TELINDY Plus ALD High-K Vertical Furnace – Other
47. Tokyo Electron Ltd. Trias W MOCVD
48. Tokyo Electron Ltd. TELINDY Plus Anneal Vertical Anneal Furnace
49. Tokyo Electron Ltd. Expedius Batch Wafer Processing
50. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
51. Tokyo Electron Ltd. TELINDY Oxide Vertical LPCVD Furnace
52. Tokyo Electron Ltd. TELINDY Oxide Vertical LPCVD Furnace
53. Tokyo Electron Ltd. TELINDY Oxide Vertical LPCVD Furnace
54. Tokyo Electron Ltd. TELINDY Oxide Vertical LPCVD Furnace
55. Tokyo Electron Ltd. CLEAN TRACK LITHIUS i+ Multi Block (Resist Coater/Developer)
56. Tokyo Electron Ltd. CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer)
57. Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
58. Tokyo Electron Ltd. CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer)
59. Tokyo Electron Ltd. Tactras Vigus Dielectric Etch
60. Tokyo Electron Ltd. TELINDY Oxide Vertical LPCVD Furnace
61. Tokyo Electron Ltd. TELINDY ALD High-K Vertical LPCVD Furnace
62. Tokyo Electron Ltd. TELINDY Anneal Vertical Anneal Furnace
63. Tokyo Electron Ltd. TELINDY ALD High-K Vertical LPCVD Furnace
64. Tokyo Electron Ltd. UW200Z Batch Wafer Processing
65. Tokyo Electron Ltd. ALPHA-303i Anneal Vertical Anneal Furnace
66. Tokyo Electron Ltd. CLEAN TRACK ACT 8 Multi Block (Resist Coater/Developer)
67. Tokyo Electron Ltd. CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer)
68. Tokyo Electron Ltd. ALPHA-303i Anneal Vertical Anneal Furnace
69. Tokyo Electron Ltd. CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer)
70. Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)
71. Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)
72. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
73. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
74. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
75. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
76. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
77. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
78. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
79. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
80. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
81. Tokyo Electron Ltd. CLEAN TRACK LITHIUS Single Block (Coat/Develop)
82. Tokyo Electron Ltd. UW300Z Batch Wafer Processing
83. Tokyo Electron Ltd. TELINDY Plus ALD High-K Vertical Furnace – Other
84. Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)
85. Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)
86. Tokyo Electron Ltd. CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer)
87. Tokyo Electron Ltd. CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer)
88. Tokyo Electron Ltd. CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer)
89. Tokyo Electron Ltd. CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer)
90. Tokyo Electron Ltd. TELINDY IRAD ALD High-K Vertical LPCVD Furnace
91. Tokyo Electron Ltd. TELINDY Oxide Vertical LPCVD Furnace
92. Tokyo Electron Ltd. TELINDY Plus Oxide Vertical LPCVD Furnace
93. Tokyo Electron Ltd. TELINDY ALD High-K Vertical LPCVD Furnace
94. Tokyo Electron Ltd. TELINDY ALD High-K Vertical LPCVD Furnace
95. Tokyo Electron Ltd. TELINDY Plus Nitride Vertical LPCVD Furnace
96. Tokyo Electron Ltd. TELINDY Plus Nitride Vertical LPCVD Furnace
97. Tokyo Electron Ltd. TELINDY Anneal Vertical Anneal Furnace
98. Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)
99. Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)
100. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
101. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
102. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
103. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
104. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
105. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
106. Tokyo Electron Ltd. Expedius+ Batch Wafer Processing
107. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
108. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
109. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
110. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
111. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
112. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
113. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
114. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
115. Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)
116. Tokyo Electron Ltd. TELINDY Doped Poly Vertical LPCVD Furnace
117. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
118. Tokyo Electron Ltd. Trias Ti/TiN Chamber Parts/Peripherals
119. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
120. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
121. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
122. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
123. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
124. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
125. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
126. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
127. Tokyo Electron Ltd. Expedius+ Batch Wafer Processing
128. Tokyo Electron Ltd. TELINDY ALD High-K Vertical LPCVD Furnace
129. Tokyo Electron Ltd. TELINDY ALD High-K Vertical LPCVD Furnace
130. Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)
131. Tokyo Electron Ltd. Trias Ti/TiN Chamber Parts/Peripherals
132. Tokyo Electron Ltd. Trias Ti/TiN Chamber Parts/Peripherals
133. Tokyo Electron Ltd. Trias Ti/TiN Chamber Parts/Peripherals
134. Tokyo Electron Ltd. TELINDY Vertical LPCVD Furnace
135. Tokyo Electron Ltd. Parts Parts/Peripherals
136. Tokyo Electron Ltd. TELINDY Plus ALD High-K Vertical Furnace – Other
137. Tokyo Electron Ltd. CLEAN TRACK LITHIUS Coat only Track
138. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
139. Tokyo Electron Ltd. CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer)
140. Tokyo Electron Ltd. CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer)
141. Tokyo Electron Ltd. CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer)
142. Tokyo Electron Ltd. Expedius-i Batch Wafer Processing
143. Tokyo Electron Ltd. TELINDY Plus ALD High-K Vertical Furnace – Other
144. Tokyo Electron Ltd. TELINDY Plus Oxide Vertical LPCVD Furnace
145. Tokyo Electron Ltd. NEXX Apollo Sputtering System
146. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
147. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
148. Tokyo Electron Ltd. TELINDY Plus ALD High-K Vertical Furnace – Other
149. Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
150. Tokyo Electron Ltd. ALPHA-303i Anneal Vertical Anneal Furnace
151. Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
152. Tokyo Electron Ltd. NEXX Apollo Sputtering System
153. Tokyo Electron Ltd. Certas WING Single Wafer Processing
154. Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
155. Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)
156. Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
157. Tokyo Electron Ltd. ALPHA-303i Anneal Vertical Anneal Furnace
158. Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
159. Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
160. Tokyo Electron Ltd. Telius 305 SCCM Dielectric Etch
161. Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
162. Tokyo Electron Ltd. Telius SP-305 SCCM Dielectric Etch
163. Tokyo Electron Ltd. TELINDY Plus ALD High-K Vertical Furnace – Other
164. Tokyo Electron Ltd. TELINDY Plus Oxide Vertical LPCVD Furnace
165. Tokyo Electron Ltd. TELINDY Plus Oxide Vertical LPCVD Furnace
166. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
167. Tokyo Electron Ltd. Triase+ Ti/TiN Metal CVD (Chemical Vapor Deposition)
168. Tokyo Electron Ltd. TELFORMULA Nitride Vertical LPCVD Furnace
169. Tokyo Electron Ltd. Trias Ti/TiN Chamber Parts/Peripherals
170. Tokyo Electron Ltd. ALPHA-303i Anneal Vertical Anneal Furnace
171. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
172. Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)
173. Tokyo Electron Ltd. Trias W MOCVD
174. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
175. Tokyo Electron Ltd. Tactras Vesta Polysilicon Etch
176. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
177. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
178. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
179. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
180. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
181. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
182. Tokyo Electron Ltd. TELFORMULA ALD High-K Vertical LPCVD Furnace
183. Tokyo Electron Ltd. CLEAN TRACK LITHIUS Coat only Track
184. Tokyo Electron Ltd. Triase+ EX-II Plus Ti/TiN Metal CVD (Chemical Vapor Deposition)
185. Tokyo Electron Ltd. Telius SP 305 DRM Dielectric Etch
186. Tokyo Electron Ltd. NT333 ALD (Atomic Layer Deposition)
187. Tokyo Electron Ltd. Trias Ti/TiN Metal CVD (Chemical Vapor Deposition)
188. Tokyo Electron Ltd. Telius SP 305 DRM Dielectric Etch
189. Tokyo Electron Ltd. CLEAN TRACK LITHIUS Multi Block (Resist Coater/Developer)
190. Tokyo Electron Ltd. (TEL) ALPHA-303i Nitride Vertical Nitride Furnace
191. Tokyo Ohka Kogyo Co., Ltd. TWM8233 Fully-Automated Wafer Bonder

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