Description
Please contact us for the availability of the used semiconductor equipment for 8 inch wafer
NO | Function | IE PU | Vendor | Model | Inspection | vintage |
22 | Cu Resistivity measurement system | MUDRV61 | KLA-TENCOR | CRS-3100 | X | |
42 | MICRO | MICRO-6 | NIKON | 0P-200C | X | |
16 | REVIEW | ROL-A1 | LEICA | INS2000 | X | |
17 | DFSEM | RSA-A1 | KLA-TENCOR | 3800C | X | |
18 | 自動載入機 | ISO-A2 | LEICA | INS10 | X | |
19 | 光學顯微鏡 | ISO-A2 | LEICA | INM20 | X | |
20 | 光罩檢查機 | RIK-A1 | KLA-TENCOR | KLA-301 | X | |
43 | MICRO | MSL-A2 | NIKON | OST-V | X | |
44 | TRACK | TRP-D1 | DNS | SD-80BWAVQ | X | |
48 | STRIP | PSS-A4 | PSC | SA2000 | X | |
50 | DFSEM | RSJ-A1 | JEOL | JWS-7555 | X | |
15 | BDFINP(Micro defect scanning system) | ES20-1 | KLA-TENCOR | ES20A | X | |
45 | CDSEM | CD-15 | KLA | ECD2 | X | |
51 | RECLAIM | RECLAIM-1 | SEMITOOL | SPECTRUM | X | |
1 | WEE | W9-7 | USHIO | PE-250R2 | Y | n/a |
2 | MASKINP | API-3000 | QC OPTICS | API-3000/5 | Y | 1996 |
4 | 熱脫附分析儀 | TDS-1 | KAWASHO | EMD-WA1000S | Y | 2000 |
5 | DOSE | DOSE-1 | THERMA-WAVE | TP-420 | Y | 1995 |
47 | SOG | SOG_B-4 | DNS | 80 | Y | 1997 |
49 | REVIEW | LEICA-3 | LEICA | INS-2000 | Y | N/A |
52 | FLAT | ADE-1 | KLA->ADE | Ultratech 9600 | Y | N/A |
53 | FLAT | ADE_B-1 | KLA->ADE | Ultratech 9600 | Y | N/A |
24 | 晶粒取放機 | ABPNP010 | Besi / 均豪 | DS-9000DATACON | Y | 2010 |
26 | 助熔劑清洗機 | ABCLF010 | SSEC | 3302 | Y | 2010 |
27 | 電漿去渣機 | ABDSC010 | C-SUN | RIE (2 FIXTURES) | Y | 2010 |
28 | 雷射刻印機 (Laser Marking) | ABLMU010 | EO | CSM-2000U-UV->WTM-2000 | Y | 2010 |
29 | 二氧化碳混合機 | ABSCO010 | NMS | “NDB-4,N4C-2.0-120NOMUR” | Y | 2005 |
31 | 電性測試機 | AEWAT010 | 旺矽 | LEDA-P6801 | Y | 2010 |
32 | 零件清洗機 | ATCLP010 | 元峰 | DUAL BATHS CLEANER (DI | Y | 2010 |
34 | 電鍍液檢控儀 | ATMCV010 | 台灣港建 TKK | QUALILAB-QL-5EX | Y | N/A |
35 | 電鍍液檢控儀 | ATMCV020 | 台灣港建 TKK | QUALILAB-QL-100EX | Y | N/A |
37 | 銅電鍍機 | ATPLT010 | 美商辛拓 SEMITOOL | RAIDER(2CU/1NI/1AU/2SR | Y | 2010 |
40 | 玻璃貼合機 | AGATH010 | MAP | SB8ESUSS | Y | N/A |