Description
Tepla 300AL Microwave plasma batch system
- Microwave plasma batch system for resist stripping and wafer cleaning
- PC controller
- Batch size: 25 wafers per load
- Temperature control: IR thermometer
- Optical end point detector
- 230v, 50/60hz, single phase, 16 amps, 2KW
- CE Certified
- Ceramic chamber: 9.6″ diameter x 15″ deep
- Microwave frequency 2.45GHz
- maximum power 1000 watts
- 4 process gas channels with MFC’s calibrated
- capacitance manometer MKS Baratron
Please contact us if you are interested in the Tepla 300AL Microwave plasma batch system. We do not own the items. These items are only for end user. They are subject to prior sales without notice. First come, first serviced. Appreciate your time.
