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Matrix Integrated System 10 Model 1107 TTW RIE Reactive Ion Etch Plasma 8 inch Asher

System 10 Model 1107,8″

Categories: 0-Partners, Asher Tags: Matrix, Plasma Asher

Description

Description

The Matrix Integrated System 10 Model 1107 TTW Plasma 8″ Wafer is only for end user. Please contact us if you have any questions. Subject to prior sale without notice. Appreciate your time!

Location: USA

Quantity: 1 set available

Wafer Size: 6/8 inch

Condition: Used. We can sell them at : (1) AS IS condition, (2) Complete, working, functional test condition.

Info from websites on the system for your reference only.

General Description
The Matrix Integrated System 10 Model 1107 Process Module is an ion enhanced, implanted photoresist removal system that reduces polymer resists in a non-damaging environment. Its design incorporates closed loop control of vital process parameters which, in mm, eliminate device damage that can be both thermal and electrical.
Process Module Assemblies
386/486 Microprocessor
Reactor Chamber
RF Generator
Pressure Controller
Temperature Controller
Vacuum Valve
Capacitive Manometer
RF Matching Network
Gas Distribution Module
Electronic Control module
Liquid Source Delive1y System (LSDS)
Features
ISOLATED REACTOR DESIGN
REACTIVE JON ETCH REACTOR
6″ OR 8″ WAFER CAPABILITY
CLOSED LOOP TEMPERATURE
CONTROL SYSTEM
BUTTERFLY TYPE PRESSURE
CONTROLLER
DISPERSIVE GAS PLENUM
PINS UP OR DOWN PROCESSING
PHASE MAGNITUDE RF
MATCHING TUNER
TIMED ENDPOINT
REDUCED OVERHEAD TIME
DIAGNOSTICS
Specifications from OEM: Download here.

ID-SS380EB

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