Description
Please contact us for the availability of the used semiconductor equipment Parts-Front-End.
[Pls use “CTRL+F “key button to search the model/key word you are interested in]
The items are subject to prior sale without notice. These items are only for end users. Appreciate your time.
| Item | Maker | Category | Model | Process | Vintage | Wafer Size |
| 1 | ADE | Metrology | WaferSight | Wafer Flatness Measurement | 2006 | 12 |
| 2 | AG Associates | RTP | HeatPulse 4100 | RTP | 1989 | 6 |
| 3 | AG Associates | RTP | HeatPulse 8800 | RTP | 2000 | 8 |
| 4 | Alcatel | Etch | Alcatel Gir | Dry Etch | – | 5 |
| 5 | AMAT | CVD | Centura TAO | Ta2O5 CVD | 2006 | 8 |
| 6 | AMAT | CVD | NLighten | Epi MOCVD | 2012 | 4 |
| 7 | AMAT | CVD | P5000 | 2CH/ WCVD | – | 6 |
| 8 | AMAT | CVD | P5000 | CVD | 1993 | 8 |
| 9 | AMAT | CVD | P5000 | LTO CVD, TEOS | 1996 | 8 |
| 10 | AMAT | CVD | P5000 | LTO CVD, TEOS | 1996 | 8 |
| 11 | AMAT | CVD | P5000 | LTO CVD, TEOS | 1995 | 8 |
| 12 | AMAT | CVD | P5000 | LTO CVD, TEOS | 1996 | 8 |
| 13 | AMAT | CVD | P5000 | LTO CVD, TEOS | 1996 | 8 |
| 14 | AMAT | CVD | P5000 | Oxide | 1996 | 8 |
| 15 | AMAT | CVD | P5000 | PECVD | – | 4 |
| 16 | AMAT | CVD | P5000 | PECVD | – | 4 |
| 17 | AMAT | CVD | P5000 | PECVD | – | 4 |
| 18 | AMAT | CVD | P5000 | PECVD | – | 5 |
| 19 | AMAT | CVD | P5000 | TEOS | 1988 | 6 |
| 20 | AMAT | CVD | P5000 | TEOS | 1990 | 6 |
| 21 | AMAT | CVD | P5000 | TEOS | 1991 | 6 |
| 22 | AMAT | CVD | Producer | SA BPSG | 2004 | 8 |
| 23 | AMAT | CVD | Producer SE | HARP-USG | 2003 | 12 |
| 24 | AMAT | CVD | Producer SE | HT ACL | 2007 | 12 |
| 25 | AMAT | CVD | Producer SE | ULK | 2006 | 12 |
| 26 | AMAT | Etch | Centura DPS | Metal | 1998 | 8 |
| 27 | AMAT | Etch | Centura DPS | Metal | 1997 | 8 |
| 28 | AMAT | Etch | Centura DPS G5 | Poly | 2006 | 12 |
| 29 | AMAT | Etch | Centura DPS G5 | Poly | 2007 | 12 |
| 30 | AMAT | Etch | Centura DPS G5 MESA | Poly | 2007 | 12 |
| 31 | AMAT | Etch | Centura DPS2 | Metal | 2005 | 12 |
| 32 | AMAT | Etch | Centura DPS2 | Metal | 2005 | 12 |
| 33 | AMAT | Etch | Centura DPS2 | Metal | 2005 | 12 |
| 34 | AMAT | Etch | Centura DPS2 | Metal | 2005 | 12 |
| 35 | AMAT | Etch | Centura DPS2 | Metal | 2005 | 12 |
| 36 | AMAT | Etch | Centura DPS2 | Poly | – | 12 |
| 37 | AMAT | Etch | Centura DPS2 | Poly | 2005 | 12 |
| 38 | AMAT | Etch | Centura DPS2 | Poly | 2005 | 12 |
| 39 | AMAT | Etch | Centura DPS532 | Metal | 2006 | 12 |
| 40 | AMAT | Etch | Centura eMax CT | Oxide | 2004 | 12 |
| 41 | AMAT | Etch | Centura eMax CT+ | Oxide | 2006 | 12 |
| 42 | AMAT | Etch | Centura Enabler | Oxide | 2010 | 12 |
| 43 | AMAT | Etch | Centura Enabler | Oxide | 2007 | 12 |
| 44 | AMAT | Etch | Centura Enabler | Oxide | 2008 | 12 |
| 45 | AMAT | Etch | Centura Enabler | Oxide | 2010 | 12 |
| 46 | AMAT | Etch | Centura Enabler | Oxide | 2006 | 12 |
| 47 | AMAT | Etch | Centura MXP | Metal | 1998 | 6 |
| 48 | AMAT | Etch | Centura MXP | Poly | 1996 | 6 |
| 49 | AMAT | Etch | P5000 | Metal | 1998 | 6 |
| 50 | AMAT | Etch | P5000 | Metal | 1997 | 6 |
| 51 | AMAT | Etch | P5000 | Metal | 1992 | 6 |
| 52 | AMAT | Etch | P5000 | Poly | 1995 | 5 |
| 53 | AMAT | Etch | P5000 | Poly | 1996 | 6 |
| 54 | AMAT | Etch | P5000 | Poly | 1995 | 8 |
| 55 | AMAT | Etch | P5000 | W | 1995 | 6 |
| 56 | AMAT | Metrology | COMPASS 300 | Patterned Wafer Inspection | 2000 | 8 |
| 57 | AMAT | Metrology | ComPlus MP | Wafer Inspection | 2004 | 8 |
| 58 | AMAT | Metrology | Orbot WF720 | Metrology | – | 5 |
| 59 | AMAT | Metrology | SEMVision CX | Defect Review SEM | 2003 | 8 |
| 60 | AMAT | Metrology | SEMVision G2 | Defect Review SEM | 2003 | 12 |
| 61 | AMAT | Metrology | SEMVision G3 | Defect Review SEM | 2006 | 12 |
| 62 | AMAT | Metrology | WF720 | Metrology | 1997 | 6 |
| 63 | AMAT | Metrology | WF730 | Metrology | 1996 | 6 |
| 64 | AMAT | PVD | Endura CL | PVD | 2000 | 12 |
| 65 | AMAT | RTP | AMC7800RPX | EPI | 1982 | 6 |
| 66 | AMAT | RTP | AMC7811 | EPI | 1990 | 6 |
| 67 | AMAT | RTP | AMC7821 | EPI | 2001 | 6 |
| 68 | AMAT | RTP | AMC7821 | EPI | 1983 | 6 |
| 69 | ASM | CVD | Dragon 2300 | PECVD Equipment for Barrier | 2003 | 12 |
| 70 | ASM | CVD | Eagle10 | DARC | – | 8 |
| 71 | ASM | CVD | Eagle10 | PETEOS | – | 8 |
| 72 | ASM | CVD | Eagle12 | Curing | 2010 | 12 |
| 73 | ASM | CVD | PXJ-200 | PECVD | 1989 | 6 |
| 74 | ASML | Stepper | PAS 2500/30 | Lithography | – | 5 |
| 75 | ASML | Stepper | PAS 2500/40 | Lithography | – | 5 |
| 76 | ASML | Stepper | PAS 2500/40 | Lithography | – | 5 |
| 77 | ASML | Stepper | PAS 5500/100D | i-Line | 1995 | 6 |
| 78 | ASML | Stepper | PAS 5500/300 | Stepper | 2000 | 8 |
| 79 | Aviza/SVG | Furnace | 10K | Diffusion | – | 5 |
| 80 | Aviza/SVG | Furnace | 10K | Diffusion | – | 5 |
| 81 | Axcelis | Asher | Microlite | Lithography | – | 5 |
| 82 | Axcelis | Track | RapidCure 320FC | UV anneal Unit | 2007 | 12 |
| 83 | Blue M | Others | DCC 606 EMP550 | – | 2005 | 12 |
| 84 | Brooks | Metrology | Bright light 200 | UV Inspection | 2002 | 8 |
| 85 | Brooks | Metrology | PRI7500 | Pod Stocker | 1997 | 8 |
| 86 | Canon | Asher | MAS-801HR | PR Stripper | – | 6 |
| 87 | Canon | Asher | MAS-801HR | PR Stripper | – | 6 |
| 88 | Canon | CVD | APT-4800 | BPSG | 2000 | 8 |
| 89 | Canon | Stepper | FPA-3000iW | i-Line Stepper | – | 8 |
| 90 | Canon | Stepper | FPA-5500iZ | i-Line Stepper | 2002 | 12 |
| 91 | CI Science | Etch | TORUS200 | Bevel Etching | 2007 | 8 |
| 92 | CI Science | Track | Charm2000 | Final Cure | 2001 | 8 |
| 93 | Cymer | Scanner | ELS-5400 | KrF Laser | 1997 | – |
| 94 | Cymer | Scanner | ELS-5410 | KrF Laser | 1998 | – |
| 95 | DNS | RTP | LA-820 | Anneal | 2000 | 8 |
| 96 | DNS | RTP | LA-820 | Lamp Anneal | 1996 | 8 |
| 97 | DNS | RTP | LA-W820-A | Lamp Anneal | 1996 | 8 |
| 98 | DNS | Track | RF-300A | Track | – | 8 |
| 99 | DNS | Track | SS-3000-A | 4 Front Scrubber | 2007 | 12 |
| 100 | DNS | Track | SS-3000-A | 4 Front Scrubber | 2007 | 12 |
| 101 | DNS | Track | SS-3000-A | 4 Front Scrubber | 2006 | 12 |
| 102 | DNS | Track | SS-3000-A | 4 Front Scrubber | 2007 | 12 |
| 103 | DNS | Track | SS-3000-A | 4 Front Scrubber | 2007 | 12 |
| 104 | DNS | Track | SS-3000-A | 4 Front Scrubber | 2006 | 12 |
| 105 | DNS | Track | SS-3000-AR | Double Side Scrubber | 2007 | 12 |
| 106 | DNS | Track | SS-3000-AR | Double Side Scrubber | 2006 | 12 |
| 107 | DNS | Track | SS-3000-AR | Double Side Scrubber | 2006 | 12 |
| 108 | DNS | Track | SS-W80A-A | Scrubber | – | 8 |
| 109 | DNS | Track | SS-W80A-A | Scrubber | – | 8 |
| 110 | DNS | Track | SS-W80A-A | Scrubber | – | 8 |
| 111 | DNS | Track | SS-W80A-A | Scrubber | – | 8 |
| 112 | DNS | Track | SS-W80A-A | Scrubber | – | 8 |
| 113 | DNS | Track | SS-W80A-A | Scrubber | – | 8 |
| 114 | DNS | Track | SS-W80A-A | Scrubber | – | 8 |
| 115 | DNS | WET | FC-3000 | Wet Station | 2003 | 12 |
| 116 | DNS | WET | MP-3000 | Wet Cleaning Equipment | 2003 | 12 |
| 117 | Dong-A | Metrology | LCM Inspector | Pattern Generator (Cameleon) | 2008 | 8 |
| 118 | EBARA | CMP | EPO-222 | WCMP | 1996 | 8 |
| 119 | EBARA | CMP | EPO-222 | WCMP | 1997 | 8 |
| 120 | EBARA | CMP | EPO-222 | WCMP | 1997 | 8 |
| 121 | EBARA | CMP | EPO-222 | WCMP | 1997 | 8 |
| 122 | EBARA | CMP | EPO-222 | WCMP | 1996 | 8 |
| 123 | EBARA | CMP | EPO-2228 | CMP | 1998 | 8 |
| 124 | EBARA | CMP | EPO-222A | W | 1999 | 8 |
| 125 | EBARA | CMP | EPO-222A | W | 2000 | 8 |
| 126 | EBARA | CMP | EPO-222A | W | 2000 | 8 |
| 127 | EBARA | CMP | EPO-222A | W | 1999 | 8 |
| 128 | EBARA | CMP | EPO-222A | W | 2000 | 8 |
| 129 | EBARA | CMP | EPO-222A | W | 1999 | 8 |
| 130 | EBARA | CMP | EPO-223 | W | 1997 | 8 |
| 131 | EBARA | CMP | EPO-223 | W | 1997 | 8 |
| 132 | EBARA | CMP | EPO-223 | W | 1997 | 8 |
| 133 | EBARA | CMP | F-REX300S | W | 2006 | 12 |
| 134 | EBARA | CMP | F-REX300S | W | 2004 | 12 |
| 135 | EBARA | CMP | F-REX300S | W | 2003 | 12 |
| 136 | Fusion | Track | M150 | Dry Etch | – | 5 |
| 137 | Fusion | Track | M150PC | Lithography | – | 6 |
| 138 | Fusion | Track | M150PC | Lithography | – | 6 |
| 139 | Fusion | Track | M150PC | UV cure | – | 6 |
| 140 | Fusion | Track | M150PC | UV cure | – | 5 |
| 141 | Fusion | Track | M150PCJ | UV cure | – | 5 |
| 142 | Hirayama | Metrology | PC-304R7 | PCT System | 1998 | 8 |
| 143 | Hitachi | Etch | DM421P | Etch | 1995 | 8 |
| 144 | Hitachi | Others | UTS2020 | Lithography | – | 6 |
| 145 | Hitachi | Metrology | I6300 | Defect Inspection | – | 12 |
| 146 | Hitachi | Metrology | I6300 | Defect Inspection | – | 12 |
| 147 | Hitachi | Metrology | IS2700 | Dark Field inspection | 2005 | 12 |
| 148 | Hitachi | Metrology | RS3000 | Review SEM | 2003 | 8, 12 |
| 149 | Hitachi | Metrology | RS3000T | Review SEM | 2007 | 12 |
| 150 | Hitachi | Metrology | RS4000 | Review SEM | 2006 | 12 |
| 151 | Hitachi | Metrology | S-4700 | FE SEM | 2002 | 12 |
| 152 | Hitachi | Metrology | S-5200 | FE SEM | 2001 | – |
| 153 | Hitachi | Metrology | S-9300T | CD SEM | 2002 | 12 |
| 154 | Hitachi | Metrology | S-9360 | CD SEM | 2003 | 12 |
| 155 | Hitachi | Metrology | S-9380 | CD SEM | 2004 | 12 |
| 156 | Hitachi | Metrology | S-9380II | CD SEM | 2007 | 12 |
| 157 | Hitachi Kokusai | Asher | RAM-8500II | Asher | 1994 | 8 |
| 158 | Hitachi Kokusai | Asher | RAM-8500II | Asher | 1994 | 8 |
| 159 | Hitachi Kokusai | Asher | RAM-8500II | Asher | 1994 | 8 |
| 160 | Hitachi Kokusai | Asher | RAM-8500ZX | Asher | 1996 | 8 |
| 161 | Hitachi Kokusai | Metrology | VR-120SD | Resistivity Measurement | – | 12 |
| 162 | Horiba | Metrology | PR-PD2 | Reticle/Mask Particle Detection System | 2006 | 6 |
| 163 | Horiba | Metrology | PR-PD2 | Reticle/Mask Particle Detection System | 2005 | 6 |
| 164 | Hugle | WET | CRD-1000 | Auto Cassette Cleaner | – | 6 |
| 165 | Hypervision | Metrology | CHIP UNZIP | Chip Unzip Process | 1996 | 8 |
| 166 | JEOL | Metrology | JSM-7401F | FE SEM | 2006 | 12 |
| 167 | Karl SUSS | Stepper | MA150 | Aligner | 1994 | 6 |
| 168 | Karl SUSS | Stepper | MA150 | Aligner | 1995 | 6 |
| 169 | Karl SUSS | Stepper | MA200 | Aligner | 1989 | 8 |
| 170 | Karl SUSS | Stepper | MA200 | Aligner | 1992 | 8 |
| 171 | KLA-Tencor | Metrology | AIT Fusion | Dark Field inspection | 2003 | 12 |
| 172 | KLA-Tencor | Metrology | AIT Fusion XUV | Dark Field inspection | 2004 | 12 |
| 173 | KLA-Tencor | Metrology | AIT UV | Dark Field inspection | 2002 | 8 |
| 174 | KLA-Tencor | Metrology | AIT UV | Dark Field inspection | 2003 | 8 |
| 175 | KLA-Tencor | Metrology | Aleris HX8500 | Thickness Measurement | 2008 | 12 |
| 176 | KLA-Tencor | Metrology | Archer 10 AIM+ | Overlay | 2002 | 12 |
| 177 | KLA-Tencor | Metrology | Archer AIM MPX | Overlay | 2005 | 12 |
| 178 | KLA-Tencor | Metrology | Archer AIM+ | Overlay | 2006 | 12 |
| 179 | KLA-Tencor | Metrology | AWIS-3110 | Particle counter | 2003 | 8 |
| 180 | KLA-Tencor | Metrology | AWIS-3110 | Particle counter | 2001 | 8 |
| 181 | KLA-Tencor | Metrology | AWIS-3110 | Wafer Inspection System | – | 8 |
| 182 | KLA-Tencor | Metrology | EDR5210 | Defect Review SEM | – | 12 |
| 183 | KLA-Tencor | Metrology | EDR5210 | Defect Review SEM | 2010 | 12 |
| 184 | KLA-Tencor | Metrology | Ergolux | Metrology | – | 6 |
| 185 | KLA-Tencor | Metrology | INM100+INS10 | Metrology | – | 6 |
| 186 | KLA-Tencor | Metrology | INS3300G1 | Macro inspection | 2001 | 12 |
| 187 | KLA-Tencor | Metrology | KLA2552 | Data Review Station | 1996 | 8 |
| 188 | KLA-Tencor | Metrology | KLA2800 | Bright Field Inspection | 2007 | 12 |
| 189 | KLA-Tencor | Metrology | KLA5100 | Metrology | – | 8 |
| 190 | KLA-Tencor | Metrology | KLA5200XP | Overlay | 1998 | 6, 8 |
| 191 | KLA-Tencor | Metrology | LDS3300M | Macro inspection | – | 8 |
| 192 | KLA-Tencor | Metrology | MPV CD2 AMC | Metrology | – | 5 |
| 193 | KLA-Tencor | Metrology | MPV CD2 AMC | Metrology | – | 5 |
| 194 | KLA-Tencor | Metrology | MPV-CD | Metrology | – | 5 |
| 195 | KLA-Tencor | Metrology | NANOMAPPER | Wafer Inspection | 2006 | 12 |
| 196 | KLA-Tencor | Metrology | OP-5240 | Thickness measurement | 2000 | 8 |
| 197 | KLA-Tencor | Metrology | P11 | Profiler | – | 6 |
| 198 | KLA-Tencor | Metrology | Puma 9000S | Dark Field inspection | 2005 | 12 |
| 199 | KLA-Tencor | Metrology | Puma 9130 | Dark Field inspection | 2005 | 12 |
| 200 | KLA-Tencor | Metrology | SFS7700 | Particle Counter | – | 5 |
| 201 | KLA-Tencor | Metrology | SP2-XP | Particle Counter | 2014 | 12 |
| 202 | KLA-Tencor | Metrology | Surfscan 2.1 | Particle Counter | – | 5 |
| 203 | Komatsu | Scanner | G20K2-1 | KrF Laser | 1999 | – |
| 204 | Komatsu | Scanner | G20K2-1 | KrF Laser | 1999 | – |
| 205 | Komatsu | Scanner | G20K4-1 | KrF Laser | 2002 | – |
| 206 | Komatsu | Scanner | G20K4-1 | KrF Laser | 2001 | – |
| 207 | Komatsu | Scanner | G20K4-1 | KrF Laser | 2002 | – |
| 208 | Lam | Etch | 2300 Versys | Poly | 2003 | 12 |
| 209 | Lam | Etch | 9600 | Etch | 1996 | 8 |
| 210 | Lam | Etch | 9600SE | Al | – | 8 |
| 211 | Lam | Etch | 9600SE | Al | – | 8 |
| 212 | Lam | Etch | 9600SE | Al | – | 8 |
| 213 | Lam | Etch | R4420 | Poly | 2004 | 8 |
| 214 | Lam | Etch | R4520 | Oxide | 1998 | 8 |
| 215 | Lam | Etch | R4520 | Oxide | 1998 | 8 |
| 216 | Lam | Etch | R4720 | Oxide | – | 8 |
| 217 | LTK | Asher | 200 Photomask | PR Stripper | – | 8 |
| 218 | Mattson | Asher | Aspen 3 | Light etch, 3LP + 2 chamber | 2006 | 12 |
| 219 | Mattson | Etch | Paradigme SP | Light Etch | 2010 | 12 |
| 220 | Mattson | Etch | Paradigme SP | Light Etch | 2010 | 12 |
| 221 | Mattson | RTP | AST3000 | RTP | 2004 | 12 |
| 222 | Mattson | RTP | AST3000 | RTP | 1998 | 8 |
| 223 | Mattson | RTP | AST3000 | RTP | 2003 | 12 |
| 224 | Mattson | RTP | AST3000 | RTP | 2002 | 8 |
| 225 | Mattson | RTP | AST3000 | RTP | 2004 | 12 |
| 226 | Mattson | RTP | AST3000 plus | RTP | 2003 | 12 |
| 227 | Mattson | RTP | Helios | RTP | 2005 | 12 |
| 228 | Mattson | RTP | Helios | RTP | 2007 | 12 |
| 229 | Mattson | RTP | Helios | RTP | 2004 | 12 |
| 230 | Met One | Metrology | DE712AF-5 | Surface Particle Counter | – | 8 |
| 231 | MKS | CVD | GHW50A-13DF3H0-10 | HDP for STI | 2015 | – |
| 232 | Montair | Etch | Prefurnace clean | General | – | 5 |
| 233 | Montair | Etch | Wafer etch | General | – | 5 |
| 234 | MSP | Metrology | 2110 | Particle Sampler | – | 8 |
| 235 | Nanometrics | Metrology | Caliper Mosaic | Overlay | 2005 | 12 |
| 236 | Nanometrics | Metrology | Caliper Mosaic | Overlay | 2002 | 12 |
| 237 | Nanometrics | Metrology | Caliper Mosaic | Overlay | 2009 | 12 |
| 238 | Nanometrics | Metrology | CDS-200 | Optical CD SEM | 2003 | 8 |
| 239 | Nanometrics | Metrology | METRA 2200M | Overlay | 1996 | 8 |
| 240 | Nanometrics | Metrology | METRA-7200 | Overlay | – | 8 |
| 241 | Nanometrics | Metrology | NanoSpec 210 | Metrology | – | 5 |
| 242 | Nanometrics | Metrology | NanoSpec AFT400 | Film Thickness Measurement | 1997 | 8 |
| 243 | Nanometrics | Metrology | SIPHER | EPI Slip and Defect | 2002 | 8 |
| 244 | Nikon | Metrology | OPTIPHOT 66 | Microscope | – | 6 |
| 245 | Nikon | Metrology | SMZ-U | Sterescopic Zoom Microscope | 1996 | 8 |
| 246 | Nikon | Metrology | SMZ-U | Sterescopic Zoom Microscope | 1996 | 8 |
| 247 | Nikon | Scanner | NSR-S204B | KrF Scanner | 2001 | 8 |
| 248 | Nikon | Scanner | NSR-S204B | KrF Scanner | 2001 | 8 |
| 249 | Nikon | Scanner | NSR-S204B | KrF Scanner | 2001 | 8 |
| 250 | Nikon | Scanner | NSR-S205C | KrF Scanner | – | 8 |
| 251 | Nikon | Scanner | NSR-S205C | KrF Scanner | – | 8 |
| 252 | Nikon | Scanner | NSR-S205C | KrF Scanner | – | 8 |
| 253 | Nikon | Scanner | NSR-S205C | KrF Scanner | – | 8 |
| 254 | Nikon | Scanner | NSR-S205C | KrF Scanner | – | 8 |
| 255 | Nikon | Scanner | NSR-S306C | ArF Scanner | 2002 | 8 |
| 256 | Nikon | Stepper | NES1-H04 | Mini stepper | 2011 | 4 |
| 257 | Nikon | Stepper | NSR-2205EX12B | KrF Stepper | – | 8 |
| 258 | Nikon | Stepper | NSR-2205EX12B | KrF Stepper | – | 8 |
| 259 | Nikon | Stepper | NSR-2205EX12B | KrF Stepper | – | 8 |
| 260 | Nikon | Stepper | NSR-2205EX14C | KrF Stepper | 1997 | 8 |
| 261 | Nikon | Stepper | NSR-2205EX14C | KrF Stepper | 1999 | 8 |
| 262 | Nikon | Stepper | NSR-2205EX14C | KrF Stepper | 2001 | 6 |
| 263 | Nikon | Stepper | NSR-2205i11D | i line stepper | 1995 | 4 |
| 264 | Novellus | Asher | Gamma Express | Asher | 2005 | 12 |
| 265 | Novellus | CVD | C2 Altus | WCVD | 1994 | 8 |
| 266 | Novellus | CVD | C2 Altus Shrink | WCVD(PNL) | 1996 | 8 |
| 267 | Novellus | CVD | C2 Speed Shrink | HDP | 2000 | 8 |
| 268 | Novellus | CVD | C2 Speed Shrink | HDP | 1999 | 8 |
| 269 | Novellus | CVD | C2 Speed Shrink | HDP | 2001 | 8 |
| 270 | Novellus | CVD | C3 Speed MAX | HDP | 2006 | 12 |
| 271 | Novellus | CVD | C3 Speed NEXT | HDP | 2004 | 12 |
| 272 | Novellus | CVD | C3 Speed XT | ILD, IMD | 2008 | 12 |
| 273 | Novellus | CVD | Concept One | CVD | – | 8 |
| 274 | Novellus | CVD | Concept One | CVD | – | 8 |
| 275 | Novellus | CVD | Concept One | CVD | – | 5 |
| 276 | Novellus | CVD | Concept One | CVD | – | 5 |
| 277 | Novellus | CVD | Concept One | CVD | – | 5 |
| 278 | Novellus | CVD | Vector | CVD | – | 12 |
| 279 | Novellus | CVD | Vector | CVD | – | 12 |
| 280 | Novellus | CVD | Vector | CVD | – | 12 |
| 281 | Novellus | CVD | Vector | CVD | – | 12 |
| 282 | Novellus | CVD | Vector | CVD | – | 12 |
| 283 | Novellus | CVD | Vector | CVD | 2004 | 12 |
| 284 | Novellus | CVD | Vector Extreme | CVD | 2010 | 12 |
| 285 | Novellus | WET | Sabre XT | Electro Copper Plating | 2000 | 8 |
| 286 | Novellus | WET | Sabre XT | Electro Copper Plating | 2001 | 8 |
| 287 | Novellus | WET | Sabre XT | Electro Copper Plating | 1999 | 8 |
| 288 | Novellus | WET | Sabre XT | Electro Copper Plating | 2001 | 8 |
| 289 | Novellus | WET | Sabre XT | Electro Copper Plating | 1999 | 8 |
| 290 | OAI | Metrology | 358 | Stepper Exposure Analyzer | – | 6 |
| 291 | OAI | Metrology | 358 | Stepper Exposure Analyzer | – | 6 |
| 292 | OAI | Metrology | 358 | Stepper Exposure Analyzer | – | 6 |
| 293 | Olympus | Metrology | BHMJL | Microscope | – | 6 |
| 294 | Olympus | Metrology | BHMJL | Microscope | – | 6 |
| 295 | Oshitari | Others | SCOV-8594 | Hard Bake Oven | 1996 | 8 |
| 296 | PSK | Asher | DES-212-304AVL | PR Stripper | – | 4, 5 |
| 297 | PSK | Asher | Tera 21 | PR Ashing | 2008 | 12 |
| 298 | Rigaku | Metrology | TXRF3750 | X-Ray Fluorescence | 2007 | 8 |
| 299 | Rudolph/August | Metrology | 3Di8500 | Wafer Inspection | 2008 | 12 |
| 300 | Rudolph/August | Metrology | Axi-S | Macro inspection | 2005 | 12 |
| 301 | Rudolph/August | Metrology | Axi-S | Macro Wafer Inspection | 2005 | 8 |
| 302 | Rudolph/August | Metrology | FE-IV | Inspection | 1995 | 8 |
| 303 | Rudolph/August | Metrology | FE-VII | Ellipsometer | – | 8 |
| 304 | Rudolph/August | Metrology | FE-VII | Focus Ellipsometer | 1993 | 8 |
| 305 | Rudolph/August | Metrology | FE-VII-D | Focus Ellipsometer | – | 8 |
| 306 | Rudolph/August | Metrology | FE-VII-D | Focus Ellipsometer | 1997 | 8 |
| 307 | Rudolph/August | Metrology | MetaPULSE 300 | Thickness Measurement | 2004 | 12 |
| 308 | Rudolph/August | Metrology | NSX105 | Macro Inspection | 2004 | 8 |
| 309 | Rudolph/August | Metrology | NSX105 | Macro Inspection | 2003 | 8 |
| 310 | Semitel | WET | Parts Cleaner | Parts Cleaner | 2004 | 8 |
| 311 | Semitel | WET | Parts Cleaner | Parts Cleaner | 2002 | 8 |
| 312 | Semitel | WET | Parts Cleaner | Parts Cleaner | 2003 | 8 |
| 313 | Semitel | WET | Parts Cleaner | Parts Cleaner | 2003 | 8 |
| 314 | Semitool | WET | Raider ECD | Electroplating | 2004 | 8 |
| 315 | Semitool | WET | Raider ECD | Electroplating | 2009 | 12 |
| 316 | Semitool | WET | SST-F-421-280-F | Spin Dryer | 1996 | 6 |
| 317 | Semitool | WET | SST-F-421-280-F | Spin Dryer | 1999 | 5 |
| 318 | Semitool | WET | SST-F-421-280-FK | Spin Dryer | 1998 | 6 |
| 319 | Semitool | WET | SST-F-421-280-K | Spin Dryer | 2000 | 6 |
| 320 | Semitool | WET | SST-F-421-280-K | Spin Dryer | 1996 | 5 |
| 321 | Semix | Track | Semix SOG coater | Lithography | – | 6 |
| 322 | Semix | Track | TZP | Lithography | – | 6 |
| 323 | SEN | Implant | NV-GSD-HE | High Energy | 1998 | 8 |
| 324 | Seojin | Metrology | SSM5200 | Capacitancy-Voltage Tester | 1997 | – |
| 325 | Shibaura | PVD | SWN5000 | Metal | – | 8 |
| 326 | Signatone | Metrology | S-1060R-6SND3L | Thermal Probing System | – | 8 |
| 327 | Silvaco | Metrology | S3245A | Noise Amplifier | 2006 | 8 |
| 328 | SOSUL | Etch | EXTRIMA6000 | Bevel Etcher | 2007 | 12 |
| 329 | SOSUL | Etch | EXTRIMA6000 | Bevel Etcher | 2010 | 12 |
| 330 | SOSUL | Etch | EXTRIMA6000 | Bevel Etcher | 2007 | 12 |
| 331 | Soul Brain | WET | Electrolysis water Unit | CLN | 2014 | 12 |
| 332 | Star | Others | 2000 Primer | ATV | – | 5 |
| 333 | Star | Others | 2000 Primer | General | – | 5 |
| 334 | STL | Track | SPARROW | CFA | 2001 | 8 |
| 335 | STL | Track | SPARROW | Quench | 2000 | 8 |
| 336 | Sumitomo | WET | KC-200A | Cassette Cleaner | 1995 | 8 |
| 337 | Sungjin Semitech | WET | F1BC02 | Ultrasonic Cleaner | 2000 | 12 |
| 338 | Sungjin Semitech | WET | Ultra Sonic | Wet Clean Station | 2001 | 12 |
| 339 | Surftens | Metrology | Measurement | Metrology | – | 6 |
| 340 | SVG | Furnace | 5204 | Diffusion | – | 5 |
| 341 | SVG | Furnace | 5204 | Diffusion | – | 5 |
| 342 | Taeyangtech | WET | TYT-PC | Wet Clean Station | 2001 | 12 |
| 343 | TEL | CVD | Trias | CVD Ti | – | 12 |
| 344 | TEL | CVD | Trias | CVD Ti | – | 12 |
| 345 | TEL | CVD | Trias | CVD Ti | 2016 | 12 |
| 346 | TEL | CVD | Trias | CVD Ti | 2016 | 12 |
| 347 | TEL | CVD | Trias | CVD Ti | 2016 | 12 |
| 348 | TEL | CVD | Trias | CVD TiN | 2004 | 12 |
| 349 | TEL | CVD | Trias | Metal | 2012 | 12 |
| 350 | TEL | Etch | Unity SCCM Shin | Etch | 2007 | 12 |
| 351 | TEL | Etch | Unity SCCM Shin | Etch | 2004 | 12 |
| 352 | TEL | Etch | Unity SCCM Shin | Etch | 2007 | 12 |
| 353 | TEL | Etch | Unity SCCM Shin | Etch | 2007 | 12 |
| 354 | TEL | Etch | Unity SCCM Shin | Oxide Etch | 2003 | 12 |
| 355 | TEL | Furnace | Alpha-303i-H | D-Poly | 2001 | 12 |
| 356 | TEL | Furnace | Alpha-303i-H | D-Poly | 2002 | 12 |
| 357 | TEL | Furnace | Alpha-303i-H | LP-N2 Anneal | 2002 | 12 |
| 358 | TEL | Furnace | Alpha-303i-H | MTO | 2002 | 12 |
| 359 | TEL | Furnace | Alpha-303i-H | MTO | 2002 | 12 |
| 360 | TEL | Furnace | Alpha-303i-H | MTO | 2001 | 12 |
| 361 | TEL | Furnace | Alpha-303i-K | MTO | 2004 | 12 |
| 362 | TEL | Furnace | Alpha-303i-K | MTO | 2004 | 12 |
| 363 | TEL | Furnace | Alpha-303i-K | MTO | 2004 | 12 |
| 364 | TEL | Furnace | Alpha-8S-C | PAD/LINER/ISO | 1995 | 8 |
| 365 | TEL | Furnace | Alpha-8S-C | Poly | 1995 | 8 |
| 366 | TEL | Furnace | Alpha-8S-Z | Dry Oxide, part machine | 1996 | 8 |
| 367 | TEL | Furnace | Alpha-8S-Z | Pyro, part machine | 1996 | 8 |
| 368 | TEL | Furnace | Formula | DCS-Sin | 2010 | 12 |
| 369 | TEL | Furnace | Formula | Nit | 2003 | 12 |
| 370 | TEL | Furnace | Formula | Nit | 2003 | 12 |
| 371 | TEL | Furnace | Formula | SiGe-POLY | 2003 | 12 |
| 372 | TEL | PVD | MarkIV | PVD | 2011 | 8 |
| 373 | TEL | Track | ACT8 | COT/DEV | 1999 | 6 |
| 374 | TEL | Track | LITHIUS | 5C5D | 2006 | 12 |
| 375 | TEL | Track | LITHIUS i+ | COT/DEV | 2006 | 8 |
| 376 | TEL | Track | Mark7 | BAKE | 1996 | 8 |
| 377 | TEL | Track | Mark7 | COT | 1996 | 8 |
| 378 | TEL | Track | Mark7 | COT | 1996 | 8 |
| 379 | TEL | Track | Mark7 | COT/DEV | 1995 | 8 |
| 380 | TEL | Track | Mark7 | COT/DEV | 1996 | 8 |
| 381 | TEL | Track | Mark7 | COT/DEV | 1994 | 8 |
| 382 | TEL | Track | Mark7 | COT/DEV | 1995 | 8 |
| 383 | TEL | Track | Mark7 | COT/DEV | 1994 | 8 |
| 384 | TEL | Track | Mark7 | COT/DEV | 1995 | 8 |
| 385 | TEL | Track | Mark7 | COT/DEV | 1994 | 8 |
| 386 | TEL | Track | Mark7 | COT/DEV | 1998 | 8 |
| 387 | TEL | Track | Mark7 | COT/DEV | 1993 | 8 |
| 388 | TEL | Track | Mark7 | DEV | 1997 | 8 |
| 389 | TEL | Track | Mark7 | DEV | 1996 | 8 |
| 390 | TEL | Track | Mark7 | DEV | 1997 | 8 |
| 391 | TEL | Track | Mark8 | COT/DEV | 1997 | 8 |
| 392 | TEL | Track | Mark8 | COT/DEV | 1997 | 8 |
| 393 | TEL | Track | Mark8 | COT/DEV | 1997 | 8 |
| 394 | TEL | Track | Mark8 | COT/DEV | 1994 | 8 |
| 395 | TEL | Track | Mark8 | COT/DEV | 1995 | 8 |
| 396 | TEL | Track | Mark8 | COT/DEV | 1995 | 8 |
| 397 | TEL | Track | Mark8 | COT/DEV | 1995 | 8 |
| 398 | TEL | Track | Mark8 | COT/DEV | 1998 | 8 |
| 399 | TEL | Track | Mark8 | COT/DEV | 1992 | 8 |
| 400 | TEL | Track | Mark8 | COT/DEV | 1995 | 8 |
| 401 | TEL | Track | Mark8 | COT/DEV | 1996 | 8 |
| 402 | TEL | Track | Mark8 | COT/DEV | 1997 | 8 |
| 403 | TES | CVD | Challenger 300 | DCVD | 2008 | – |
| 404 | Ultratech | Stepper | 1500 | Lithography | 2000 | 6 |
| 405 | Ultratech | Stepper | 1500 | Lithography | 2000 | 6 |
| 406 | Ultratech | Stepper | 1500 | Lithography | 1996 | 6 |
| 407 | Ulvac | Asher | RISE-200 | Asher | 2006 | 8 |
| 408 | Ulvac | PVD | Ceraus Z-1000 | Metal | – | 8 |
| 409 | Ulvac | PVD | Ceraus ZX-1000 | PVD | 2000 | 8 |
| 410 | Ulvac | PVD | Ceraus ZX-1000 | PVD | 2000 | 8 |
| 411 | Ulvac | PVD | Ceraus ZX-1000 | PVD | 2000 | 8 |
| 412 | Ulvac | PVD | Ceraus ZX-1000 | PVD | 1995 | 8 |
| 413 | Ulvac | PVD | Ceraus ZX-1000 | PVD | 1996 | 8 |
| 414 | Ulvac | PVD | Ceraus ZX-1000 | PVD | 1996 | 8 |
| 415 | Ulvac | PVD | Entron EX | TSV Bump UBM | 2006 | 12 |
| 416 | Ulvac | PVD | Entron EX W300 | PVD | 2007 | 12 |
| 417 | Ulvac | PVD | Entron EX W300 | PVD | 2011 | 12 |
| 418 | Ulvac | PVD | Entron S | PVD | – | 12 |
| 419 | Ulvac | PVD | Entron T | PVD | – | 12 |
| 420 | UNAXIS | PVD | LLS900 | PVD | – | 8 |
| 421 | Ushio | Track | UMA-1002-HC93FS | Stabilizer | 1997 | 8 |
| 422 | Ushio | Track | UMA-1002-HC93FWL | Stabilizer | 1997 | 8 |
| 423 | Veeco | Metrology | UVX310 | Step Profiler | 2003 | 8 |
| 424 | Veeco | Metrology | V200 | Profiler | – | 8 |
| 425 | WONIK IPS | CVD | Bluetain | MCVD | 2008 | 12 |
| 426 | Yield Engineering System | Others | YES-5 | Lithography | – | 6 |
| 427 | Yield Engineering System | Others | YES-5E | Lithography | – | 6 |
| 428 | Yield Engineering System | Others | YES-5E | Lithography | – | 6 |
The items are subject to prior sale without notice. These items are only for end users. Appreciate your time.
SS5684















