Description
Model: LAM TCP9400 SE
Category: Plasma Etch
Original Equipment Manufacturer: Lam Research
Condition: Cold Shut down, Complete,Working
Process: POLY ETCHER
Wafer Size: 8-inch
Valid Time: Subject to prior sale
Vintage: 1997
Serial Number:4065
Software Version: 1.6.1
CIM: Linked
Main System:LAM POLY ETCHER
SMIF System: ASSYST (2 Units)
Process Chamber: 1 Unit
Edwards 40/80 TCU: 1 Unit
Ebara Pump: 3 Units
Inspection: Against appointment after PO and payment.
Equipment Configuration:
- Machine Serial Number 4065
- Chamber config Type TCP 9400SE
- TCP RF Match Part No. 853-032294-002
- Bias RF Match 853-025083-001
- ESC Power Supply 810-017086-010
- Chamber manometer. MKS Make (All) E29B-23813
- Turbo Manometer MKS Make (All) 625A11TDE
- Ref Manometer MKS Make (All) 625A11TDE
- Turbo Pump STPH-2000L
- TCP RF Gen. -AE Make(All) 660-24637-006 RFDS
- BIAS RF Gen.AE Make( All) 660-024637-013 HALO
- Wafer Drag Back ENABLE
- Wafer Offset alignment Alignment 300
- Gas Ring Capacitance 1300+/- 15 pf
- Software Version 1.6.1
- MFC Config.CL2-200 sccm 190
- MFC Config.O2-20 sccm 100
- MFC Config.HE/O2-200 sccm 20
- MFC Config.CF4-100 sccm 100
- MFC Config.HBR-500/300sccm 525
- MFC Config.SF6-100 sccm 100
- MFC Config.HE-500 sccm 500
- MFC Config.CL2-30 sccm
- TCP Coil position 8 o clk
- Chiller used BOC 40/80
- Vat Vale/Pendulum Valve Pendulum
- PC Pump A30W
- Load Lock Pump A30W
- Turbo Pump capacity 2000L
- TCP RF AO Setting 1250
- TCP AI Setting 1250
- TCP REF PWR AI Setting 250
- BIAS AO Setting 1250
- BIAS AI Setting 1250
- BIAS REF PWR AI Setting 250
All the Lam Plasma Etcher equipment trademarks belongs to Lam Research , the original equipment manufacturer. All rights reserved.